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Opportunity Details

Solicitation Number: NIST-FY25-CHIPS-0059

Date Added: February 12, 2025

Description:

The purpose of this sources sought notice is to conduct market research and identify potential sources of commercial products/services that satisfy the Government’s anticipated needs.

BACKGROUND

The National Institute of Standards and Technology (NIST), Inorganic Chemical Metrology Group (ICMG) performs elemental measurements using a variety of instrumental methods. With these methods, we fulfill the customer needs through the provision of NIST Standard Reference Materials (SRMs) and development of methods used for the value assignment of elemental data to SRMs. In addition to SRMs, the group also provides the community with Reference Materials (RMs), and Research Grade Test Materials (RGTMs) which can be developed into SRMs in the future. The group also manages hundreds of these materials, from purchasing of raw materials to the stability testing over time to meet the needs of the customers.

For this project, we will develop new SRMs, Reference Materials (RMs), and Research Grade Test Materials (RGTMs) of high-purity solids currently lacking in chips manufacturing. Purity of materials used to create semiconductors is critical for industry. Our RMs and RGTMs will enable more effective, efficient, and comparable characterizations of source materials, as well as process control improvements. To achieve these goals, we will develop new NIST capabilities to measure elemental information at trace levels in the material using an Inductively Couple Plasma-Mass Spectrometry (ICP-MS) in tandem with a Laser Induced Breakdown Spectroscopy (LIBS) instrument. The ICP-MS needs to have the ability to perform laser ablation so we can measure trace elements in the material and determine the homogeneity or any impurities in the materials. The LIBS instrument has the capacity to measure elements that span the periodic table while also providing spatial information about the materials in the form of elemental mapping of the surface or depth-profiling into the material. When used in tandem with an ICP-MS, the detection limits for elements of interest in lower, providing us more information about potential homogeneity issues or contaminants at a much lower concentration. Spatial information is important because it is the key to understanding the homogeneity of the material and ensure it also meets the purity that industry needs to manufacture high-quality semiconductors. The instrument obtained for this project must have the ability to perform this type of spatial and elemental analysis.

NIST is seeking information from sources that may be capable of providing a solution that will achieve the objectives described above, in addition to the following essential requirements: 

    1. The ICP-MS instrument must include sample introduction system, that after no more than two (2) ignition cycles, must produce a stable plasma when any of the commonly available ICP nebulizers (cross-flow, concentric, microconcentric) and spray chambers (cyclonic, Scott-type and combinations thereof) are used to perform analyses.
    2. A mass range of 2-240 amu, be capable of achieving sensitivities from ppt to high ppm without dilution, and a mass calibration stability of better than 0.05 amu per day.
    3. In addition, stable plasmas must be obtained when commonly used alternate sample introduction systems such as Laser Ablation, ETV, FIA, GC, HPLC systems are interfaced to the instrument. The instrument design must permit switching between different sample introduction systems with ease and without affecting the instrument’s performance.
    4. The microconcentric nebulizer must be provided with low flow (20 ul/min, 50 ul/min, 100 ul/min and 200 ul/min) integrated autosampler Probes (PEEK or Carbon).
    5. Cooling, auxiliary and nebulizer gas flows must use mass flow controllers.
    6. The instrument must have a minimum of 2 additional programmable/digital external mass flow controllers (MFCs).  At a minimum, one controller must be optimized for a Helium (He) and Argon (Ar) gases to be used with a laser ablation system. The mass flow controllers must be software controlled allowing the user to independently adjust flow rates of the two channels.
    7. The instrument shall include an ESI SC-2 DX, or equivalent, HF-resistant auto sampler system with integrated Autosampler Probe (PEEK or Carbon) capable of flow rates ranging from 0.02 mL/min to 2 mL/min, holding samples from 0.5 mL to 250 mL. The autosampler must be capable of sampling from racks housing vials of 4 mL, 10 mL, and 50 mL capacity at a minimum. The autosampler must be compatible with the instrument software.
    8. The instrument must be supplied with a peristaltic pump with a minimum of 3 channels that can be controlled by the instrument software. Appropriate compatible drainage tubing must also be provided for th

Set-Aside: N/A (N/A)

Place of Performance: N/A, Maryland, UNITED STATES

NAICS Codes:
334516

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